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| Evaluation of the Uncertainty for the Measurement of Micro-nano Geometric Structure by Metrological SEM |
| MIAO Qi1,2，GAO Si-tian2,LI Wei2,SHI Yu-shu2,LI Qi2,LU Rong-sheng1 |
1. Hefei University of Technology, Hefei, Anhui 230009, China;
2. National Institute of Metrology, Beijing 100029, China |
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Abstract Scanning electron microscope (SEM) is an effective tool in microstructure analysis and measurement.The surface of various materials can be analyzed by SEM.SEM has become one of the main measurement tool especially for micro-nano geometry measurement under 100 nm.The instrument of the metrological SEM is developed for calibration nanostructure and realized the traceability of SEM.The 2 dimensional structure of sample is obtained by stage scanning, and the measured result is traced to laser wavelength by interferometer.The nano structure dimension is measured and traced to SI unit.The SEM calibration artifact is measured by this instrument and the uncertainty is evaluated,and an uncertainty better than 20 nm is obtained for grating artifices.
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［1］高思田.计量型原子力显微镜的研究［D］.天津:天津大学,2007.
［2］卢明臻,高思田,金其海,等.一种用于纳米计量的原子力显微镜测头的设计［J］.中国计量学院学报,2006,17(3),178-181.
［3］陈振宇, 周剑雄.扫描电镜用于微米,纳米尺度的测量及其标准化探讨［J］.电子显微学报, 2006, 25(1): 137-137.
［4］文良栋.纳米微位移工作台在计量型扫描电镜中的应用［D］.北京:中国科学院,2013.
［5］张训彪.纳米级长度扫描电镜测量的现状和展望 ［J］.上海计量测试, 2007,34(2): 2-9.
［6］王林春,江月松,辛遥,等.频率扫描干涉中参考干涉仪的非线性误差分析［J］.光电子激光,2010,21(9):1355-1358.
［7］张海良,张学骛,贾宏辉,等.扫描电镜测量微米级长度测量实验中不确定度的评定方法［J］.国防科技大学,2009,22(1):79-81.
［8］李庆贤,高思田,李伟,等.基于HSPMI的激光干涉位移校准系统的构建及实验研究［J］.计量学报,2013,34(6):519-523.
［9］张志涌.精通MATLAB R2011a［M］.北京:北京航天航空大学出版社,2011. |
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2014, Vol. 35 
