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| Research on the Method of Nanometer Grating Spacing Comparison Measurement Based on Cr Atomic Lithography Technology |
| CHEN Kai-qing1,2,4,GUAN Yu-qing2,4,ZOU Wen-zhe2,4,DENG Xiao3,KONG Ming1,CHEN Ya-qing1,2,4,XIONG Ying-fan3,FU Yun-xia1,2,4,LEI Li-hua1,2,4 |
1. College of Metrology & Measurement Engineering, China Jiliang University, Hangzhou,Zhejiang 310018, China
2. Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China
3. School of Physical Science and Engineering, Tongji University, Shanghai 200092
4. Shanghai Key Laboratory of Online Test and Control Technology, Shanghai 201203, China |
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Abstract A method of nanometer grating spacing comparison measurement based on Cr atomic lithography technology is established. Based on the feasibility of establishing a calibration traceability system for standard templates based on national self-traceable grating reference materials, it ensures higher precision and traceability of measuring instruments . Precision nanometer measuring instruments that can be adapted to different resolutions, sequentially increasing multi-period electron beam direct writing grating template was designed and fabricated, the nominal pitch values are 200, 400, 600, 800, 1000nm. After the national self-traceable grating reference material comparison, AFM completed the measurement and characterization of the nano-grid standard sample. The experiment shows that the uniformity level of the grating standard sample prepared by electron beam direct writing is less than 1nm, and the uncertainty is less than 2%. The gratings have good uniformity, accuracy and stability, which verifies that the developed grating standard template can be used as an ideal physical standard in the traceability system of nano-geometric quantities. A method of nanometer grating spacing comparison measurement based on Cr atomic lithography technology is established. Based on the feasibility of establishing a calibration traceability system for standard templates based on national self-traceable grating reference materials, it ensures higher precision and traceability of measuring instruments (AFM, SEM, etc.); In order to meet the needs of high-precision nanometer measuring instruments that can be adapted to different resolutions, sequentially increasing multi-period electron beam direct writing grating template was designed and fabricated, the nominal pitch values are 200nm, 400nm, 600nm, 800nm, 1000nm. After the national self-traceable grating reference material comparison, AFM completed the measurement and characterization of the nano-grid standard sample. The experiment shows that the uniformity level of the grating standard sample prepared by electron beam direct writing is less than 1nm, and the uncertainty is less than 2%. The gratings have good uniformity, accuracy and stability, which verifies that the developed grating standard template can be used as an ideal physical standard in the traceability system of nano-geometric quantities. The nanometer grating spacing comparison measurement method based on Cr atomic lithography technology can provide a guarantee for the development and breakthrough of countrys nano-industry.
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Received: 17 May 2022
Published: 18 May 2023
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2023, Vol. 44 
