一种对在片测量系统中串扰误差进行修正的新型校准方法

doi:10.3969/j.issn.1000-1158.2021.12.01

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Abstract The conventional calibration method for high frequency on-wafer scattering parameters comprises 16-term error model and two-tier crosstalk correction method based on Multiline TRL, both of which did well at charactering the leakage in measurement system. A novel method is proposed here, taking the leakage in measurement system as a parallel two-port network with the device under test (DUT). The method is divided into two parts. Firstly apply the SOLR calibration method to obtain the eight-term basic error box, then measure a crosstalk standard (could be an open standard in SOLR) to deduce the crosstalk error box. Simulation and measurement results show that, the accuracy of the novel method is comparative to the 16-term method with four less calibration kits, and has a positive response at the crosstalk, and also the novel method improved test efficiency.

Key words： metrology on-wafer scattering parameter 16-term error model crosstalk SOLR

Received: 13 August 2020 Published: 06 December 2021

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TB973

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	Articles by authors
	WANG Yi-bang
	WU Ai-hua
	LIU Chen
	LIANG Fa-guo
	LUAN Peng
	HUO Ye
	SUN Jing
	ZHAO Wei

Cite this article:

WANG Yi-bang,WU Ai-hua,LIU Chen, et al. A Novel Calibration Method at On-Wafer Measurement System Affected by Leakage[J]. Acta Metrologica Sinica, 2021, 42(12): 1552-1557.

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http://jlxb.china-csm.org:81/Jwk_jlxb/EN/10.3969/j.issn.1000-1158.2021.12.01 OR http://jlxb.china-csm.org:81/Jwk_jlxb/EN/Y2021/V42/I12/1552

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