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| The Research of Nanometer Linewidth Calibration Method Used by 248 nm Ultraviolet Microscope |
| LI Qi1,LI Wei1,SHI Yu-shu1,GAO Si-tian1,LI Shi1,WANG He-qun1,YIN Chuan-xiang1,2 |
1. National Institute of Metrology, Beijing 100029, China;
2.Hefei University of Technology, Hefei, Anhui 230009, China |
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Abstract When utilizing 248 nm ultraviolet illumination, the microscope can attain as high as 80nm optical resolution, which can achieve the measurements of linewidth and one /two dimensional pitches of photomasks. But at present, the measurement uncertainty of 248 nm UV microscope is not known yet, it is need to do calibration for the instrument. Since the measurement range of 248 nm UV microscope is within nanometer range, it is reasonable to use 400 nm one dimensional pitches standard materials to do calibration. Through the estimation of instrument uncertainty and standard materials own uncertainty, it can calculate the expansion uncertainty of a single pixel which equals to 0.178 nm, and the uncertainty estimation formula of measurements are given.
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2015, Vol. 36 
