|
|
|
| Multi-DOF Laser Interferometry System for Metrological Standard Device for Nano-geometrical Characteristic Size in Millimeter Range |
| SHI Yu-shu,ZHANG Shu,LIAN Xiao-yi,LI Wei,LI Qi,HUANG Lu,GAO Si-tian |
| National Institute of Metrology, Beijing 100029, China |
|
|
|
|
Abstract Accurate measurement of nano-geometric structure is the key technical support to improve the quality and performance of integrated circuits, micro-nano electromechanical systems and micro-nano technology products.In order to obtain accurate measurement results, it is necessary to realize the measurement value traceability and built the value transfer system.To meet the metrology requirements of nanometer geometry structure from small to large range, the metrological calibration device for nano-geometrical characteristic size in millimeter range is developed which integrated with multi-degree of freedom (multi-DOF) laser interferometry system, and the results can be traced to SI units.The results shows that the device can achieve the measurement accuracy in nanoscale in the measurement range in millimeter level, and the resolution is achieved sub-nanometer scale.
|
|
Received: 14 January 2019
Published: 29 June 2020
|
|
|
|
|
|
［1］Leach R K, Boyd R, Burke T, et al. The European nanometrology landscape［J］. Nanotechnology, 2011, 22(6): 062001.
［2］国家集成电路产业发展推进纲要［EB/OL］. (2014-06-24)［2014-08-25］. http://www.miit.gov.cn/n11293472/n11293832/n11293907/n11368223/16044261.html.
［3］郭鑫, 施玉书, 皮磊, 等. Mirau干涉型微纳台阶高度测量系统的研究［J］. 计量学报, 2017,38(2): 141-144.
Guo X, Shi Y S, Pi L, et al. Research on Micro/nano Step Height Measurement System of Mirau Interference［J］. Acta Metrologica Sinica, 2017, 38(2): 141-144.
［4］林启敬, 吴昊, 张福政, 等. Cu/Ti纳米薄膜表面形貌的分形表征研究［J］. 计量学报, 2018,39(5): 593-597.
Lin Q J, Wu H, Zhang F Z, et al. Research on Fractal Characterization of the Surface Morphology of Cu/Ti Nano Thin Film［J］. Acta Metrologica Sinica, 2018,39(5): 593-597
［5］施玉书, 连笑怡, 王艺瑄, 等. AFM扫描过程的模拟及针尖形状反求［J］. 计量学报, 2019, 40(2): 177-182.
Shi Y S, Lian X Y, Wang Y X, et al. Simiulation of AFM Scanning Process and Tip Shape Estimation ［J］. Acta Metrologica Sinica, 2019, 40(2): 177-182.
［6］王本力. NASA《2015技术路线图》对我国纳米技术发展的启示［J］. 新材料产业, 2018,(1): 26-28.
［7］卢明臻, 高思田, 杜华, 等. 计量型原子力测头模型研究及性能分析［J］. 纳米技术与精密工程, 2007, 5(1): 33-37.
Lu M Z, Gao S T, Du H, et al. Model of a Metrological AFM Head and Performance Analysis［J］. Nanotechnology and Precision Eng ineer ing Analysis,2007, 5(1): 33-37.
［8］卢明臻, 高思田, 杜华, 等. 大范围纳米结构测量系统原子力测头的研究 ［C］//2007中国仪器仪表与测控技术交流大会. 北京, 2007: 654-662.
［9］Li W, Gao S T, Lu M Z, et al. Position measuring system in metrological atomic force microscope［J］. Optics and Precision Engineering, 2012,20(4): 796-802.
［10］来展. 激光干涉仪信号处理系统及纳米测量机控制系统的研究［D］. 杭州: 中国计量学院, 2011.
［11］Ducourtieux S, Poyet B. Development of a metrological atomic force microscope with minimized Abbe error and differential interferometer-based real-time position control ［J］. Measurement Science & Technology, 2011, 22 (9): 094010
［12］Lu M Z, Gao S T, Li Q, et al. Long range metrological atomic force microscope with versatile measuring head ［C］//Eighth International Symposium on Precision Engineering Measurement and Instrumentation.Chengdu, China, 2013.
［13］羡一民, 王科峰. 激光干涉仪技术及发展［J］. 工具技术, 2003, 37(11): 68-74.
［14］高宏堂, 高思田, 邵宏伟. 单频纳米激光干涉仪非线性误差及其修正方法［J］. 计量学报, 2006, 27(z1): 26-30.
Gao H T, Gao S T, Shao H W.Nonlinearity Error and the Correction Method for Homodyne Laser Interferometer with Nanometer Accuracy［J］. Acta Metrologica Sinica, 2006, 27(z1): 26-30. |
|
|
|
2020, Vol. 41 
