Abstract：The primary technology for enhancing the positioning accuracy of the wafer calibrator involves compensating for the rotation error of the wafer calibrator rotation axis. This paper introduces a rotation error compensation method based on a single sensor, which effectively mitigates the introduction of new errors and multiple calibration issues associated with the use of multiple sensors and auxiliary equipment. This approach employs a dual filtering technique comprising ensemble averaging and wavelet threshold denoising to diminish random noise in the collected signal and accurately segregate the roundness error from the high signal-to-noise ratio measurement signal using mathematical and statistical error separation methods. Simultaneously, the precise rotation error is determined through a multi-position measurement method, and the error data is utilized to rectify the wafer circumference data detected by the sensor to achieve compensation. The experimental results show that after using the method proposed in this article, the calibration deviation of the wafer calibrator positioning is about 0.02mm,and enhances calibration accuracy, thereby validating its effectiveness.
2024, Vol. 45 
